Invention Grant
- Patent Title: Exposure apparatus and device manufacturing method
- Patent Title (中): 曝光装置和装置制造方法
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Application No.: US11387530Application Date: 2006-03-23
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Publication No.: US07697112B2Publication Date: 2010-04-13
- Inventor: Kazuki Fujimoto
- Applicant: Kazuki Fujimoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Cowan, Liebowitz & Latman, P.C.
- Priority: JP2005-084512 20050323; JP2006-074413 20060317
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
An exposure apparatus for exposing a substrate to light via a reticle includes a first plurality of optical elements configured to direct the light; a first vacuum chamber configured to accommodate said first plurality of optical elements; a first support configured to support said first vacuum chamber; and a second support configured to support at least one of said first plurality of optical elements substantially independently of said first support.
Public/Granted literature
- US20060215136A1 Exposure apparatus and device manufacturing method Public/Granted day:2006-09-28
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