Invention Grant
US07697222B2 Apparatus for holding optical element, barrel, exposure apparatus, and device producing method
有权
用于保持光学元件,镜筒,曝光装置和装置制造方法的装置
- Patent Title: Apparatus for holding optical element, barrel, exposure apparatus, and device producing method
- Patent Title (中): 用于保持光学元件,镜筒,曝光装置和装置制造方法的装置
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Application No.: US10584177Application Date: 2004-12-22
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Publication No.: US07697222B2Publication Date: 2010-04-13
- Inventor: Yuichi Shibazaki
- Applicant: Yuichi Shibazaki
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2003-431484 20031225
- International Application: PCT/JP2004/019265 WO 20041222
- International Announcement: WO2005/064382 WO 20050714
- Main IPC: G02B7/02
- IPC: G02B7/02

Abstract:
A holding apparatus (38) for holding an optical element (37) at a controlled position and attitude. The optical element (37) is held at an inner ring (43) by a piezo housing (54). A piezo element (65) is isolated from the optical element (37). When the piezo element (65) elongates and contracts, a displacement section (70) is displaced in a plane perpendicular to the optical axis of the optical element while being guided by a parallel link section (71). A transmission link section (72) converts the direction of the displacement of the optical element (37) to transmit the result to a part of the inner ring (43).
Public/Granted literature
- US20070183064A1 APPARATUS FOR HOLDING OPTICAL ELEMENT, BARREL, EXPOSURE APPARATUS, AND DEVICE PRODUCING METHOD Public/Granted day:2007-08-09
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |