Invention Grant
- Patent Title: Capacitor and method for manufacturing same
- Patent Title (中): 电容器及其制造方法
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Application No.: US12159699Application Date: 2006-12-27
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Publication No.: US07697267B2Publication Date: 2010-04-13
- Inventor: Hideki Oohata , Akihiko Shirakawa
- Applicant: Hideki Oohata , Akihiko Shirakawa
- Applicant Address: JP Tokyo
- Assignee: Showa Denko K.K.
- Current Assignee: Showa Denko K.K.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2005-377040 20051228
- International Application: PCT/JP2006/326092 WO 20061227
- International Announcement: WO2007/077883 WO 20070712
- Main IPC: H01G9/00
- IPC: H01G9/00

Abstract:
The present invention relates to a capacitor having high capacitance, low ESR (equivalent series resistance) in a high-frequency region and low leakage current, including a composite oxide film obtained by reaction of an oxide film obtained by subjecting the surface of the substrate comprising valve-acting metal element to electrolytic oxidation with a solution in which metal ion and an organic base are dissolved and by subsequently sintering the reactant, a solid electrolyte formed on the composite oxide film and a conductor layer formed thereon; a method for producing the same and electronic devices using the same.
Public/Granted literature
- US20080316681A1 Capacitor and Method for Manufacturing Same Public/Granted day:2008-12-25
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