Invention Grant
US07697316B2 Multi-level cell resistance random access memory with metal oxides
有权
具有金属氧化物的多层电池随机存取存储器
- Patent Title: Multi-level cell resistance random access memory with metal oxides
- Patent Title (中): 具有金属氧化物的多层电池随机存取存储器
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Application No.: US11567978Application Date: 2006-12-07
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Publication No.: US07697316B2Publication Date: 2010-04-13
- Inventor: Erh-Kun Lai , ChiaHua Ho , Kuang Yeu Hsieh
- Applicant: Erh-Kun Lai , ChiaHua Ho , Kuang Yeu Hsieh
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Hayes Beffel & Wolfeld LLP
- Agent Warren S. Wolfeld
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A bistable resistance random access memory comprises a plurality of programmable resistance random access memory cells where each programmable resistance random access memory cell includes multiple memory members for performing multiple bits for each memory cell. The bistable RRAM includes a first resistance random access member connected to a second resistance random access member through interconnect metal liners and metal oxide strips. The first resistance random access member has a first resistance value Ra, which is determined from the thickness of the first resistance random access member based on the deposition of the first resistance random access member. The second resistance random access member has a second resistance value Rb, which is determined from the thickness of the second resistance random access member based on the deposition of the second resistance random access member.
Public/Granted literature
- US20080135824A1 Method and Structure of a Multi-Level Cell Resistance Random Access Memory with Metal Oxides Public/Granted day:2008-06-12
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