Invention Grant
- Patent Title: Inspection system and inspection method
- Patent Title (中): 检验制度和检验方法
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Application No.: US11251909Application Date: 2005-10-18
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Publication No.: US07697746B2Publication Date: 2010-04-13
- Inventor: Hiroshi Kawaguchi
- Applicant: Hiroshi Kawaguchi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2004-303172 20041018
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
The inspection system arbitrarily selects from among a plurality of optical conditions to change a distribution of reflected or diffracted light component from an object being inspected. The inspection system has a one- or two-dimensional optoelectric conversion image sensor, optically acquires an image of the object by scanning a stage on which the object is mounted or scanning the image sensor, and processes the image to check for defects in the object. Under each optical condition (illumination optical system, detection optical system, scan direction, etc.) the object being inspected is imaged and, based on the brightness distribution and contrast in the detection field of the image sensor, image sensor output correction data is generated to correct the output of the image sensor.
Public/Granted literature
- US20060083420A1 Inspection system and inspection method Public/Granted day:2006-04-20
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