Invention Grant
- Patent Title: Characterizing across-die process variation
- Patent Title (中): 表征跨模工艺变化
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Application No.: US11946571Application Date: 2007-11-28
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Publication No.: US07698079B2Publication Date: 2010-04-13
- Inventor: Dhruva J. Acharyya , Kanak B. Agarwal
- Applicant: Dhruva J. Acharyya , Kanak B. Agarwal
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Dillon & Yudell LLP
- Main IPC: G01R19/00
- IPC: G01R19/00

Abstract:
Measurement of individual quiescent supply currents from multiple power supply pads located across a semiconductor die provides a means of characterizing across-die variation. A ratio is created by combining the individual pad supply current with the sum of all pad supply currents for a given die. An n-tuple is formed from the set of ratios for all pad supply currents to provide a unique signature for different across-die variation profiles.
Public/Granted literature
- US20090138227A1 Characterizing Across-Die Process Variation Public/Granted day:2009-05-28
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