Invention Grant
US07698665B2 Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern
有权
使用多边形图案的功能表示的可制造掩模的系统，掩模和方法
- Patent Title: Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern
- Patent Title (中): 使用多边形图案的功能表示的可制造掩模的系统，掩模和方法
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Application No.: US11245691Application Date: 2005-10-06
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Publication No.: US07698665B2Publication Date: 2010-04-13
- Inventor: Daniel S. Abrams , David Irby
- Applicant: Daniel S. Abrams , David Irby
- Applicant Address: US CA Palo Alto
- Assignee: Luminescent Technologies, Inc.
- Current Assignee: Luminescent Technologies, Inc.
- Current Assignee Address: US CA Palo Alto
- Agency: Wilson Sonsini Goodrich & Rosati
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
Photomask patterns are represented using contours defined by mask functions or other formats. Given target pattern, contours may be optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimized patterns or blocks may be simplified for mask manufacturing.
Public/Granted literature
- US20070009808A1 Systems, masks, and methods for manufacturable masks Public/Granted day:2007-01-11
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