Invention Grant
US07699932B2 Reactors, systems and methods for depositing thin films onto microfeature workpieces
有权
将薄膜沉积在微型工件上的反应器,系统和方法
- Patent Title: Reactors, systems and methods for depositing thin films onto microfeature workpieces
- Patent Title (中): 将薄膜沉积在微型工件上的反应器,系统和方法
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Application No.: US10859883Application Date: 2004-06-02
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Publication No.: US07699932B2Publication Date: 2010-04-20
- Inventor: Matthew W. Miller , Cem Basceri
- Applicant: Matthew W. Miller , Cem Basceri
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/455 ; C23C16/458 ; H01L21/306

Abstract:
A reactor, system including reactors, and methods for depositing thin films on microfeature workpieces comprising a reaction vessel having a chamber, a gas distributor attached to the reaction vessel, a workpiece holder in the chamber, and a side unit in the reaction vessel at a location relative to the gas distributor and/or the workpiece holder. The gas distributor has a plurality of primary outlets open to the chamber, and the workpiece holder has a process site aligned with the primary outlets. The side unit has a secondary outlet open to the chamber that operates independently of the primary outlets. One of the inner compartment, the side unit and/or the workpiece holder can be movable between a first position to form a small-volume cell for introducing the reactant gases to the microfeature workpiece and a second position to form a large volume space for purging the reactant gases.
Public/Granted literature
- US20050268856A1 Reactors, systems and methods for depositing thin films onto microfeature workpieces Public/Granted day:2005-12-08
Information query
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