Invention Grant
- Patent Title: High-gain vertex lateral bipolar junction transistor
- Patent Title (中): 高增益顶点横向双极结型晶体管
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Application No.: US11589478Application Date: 2006-10-30
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Publication No.: US07701038B2Publication Date: 2010-04-20
- Inventor: Shuo-Mao Chen , Chih-Ping Chao , Chih-Sheng Chang
- Applicant: Shuo-Mao Chen , Chih-Ping Chao , Chih-Sheng Chang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/8249
- IPC: H01L21/8249 ; H01L21/331 ; H01L21/70 ; H01L21/02

Abstract:
A lateral bipolar junction transistor having improved current gain and a method for forming the same are provided. The transistor includes a well region of a first conductivity type formed over a substrate, at least one emitter of a second conductivity type opposite the first conductivity type in the well region wherein each of the at least one emitters are interconnected, a plurality of collectors of the second conductivity type in the well region wherein the collectors are interconnected to each other, and a plurality of base contacts of the first conductivity type in the well region wherein the base contacts are interconnected to each other. Preferably, all sides of the at least one emitters are adjacent the collectors, and none of the base contacts are adjacent the sides of the emitters. The neighboring emitter, collectors and base contacts are separated by spacings in the well region.
Public/Granted literature
- US20070105301A1 High-gain vertex lateral bipolar junction transistor Public/Granted day:2007-05-10
Information query
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