Invention Grant
- Patent Title: Manufacture of electroless cobalt deposition compositions for microelectronics applications
- Patent Title (中): 用于微电子应用的无电钴沉积组合物的制造
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Application No.: US11549775Application Date: 2006-10-16
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Publication No.: US07704306B2Publication Date: 2010-04-27
- Inventor: Qingyun Chen , Richard Hurtubise , Vincent Paneccasio , Charles Valverde , Daniel Stritch
- Applicant: Qingyun Chen , Richard Hurtubise , Vincent Paneccasio , Charles Valverde , Daniel Stritch
- Applicant Address: US CT West Haven
- Assignee: Enthone Inc.
- Current Assignee: Enthone Inc.
- Current Assignee Address: US CT West Haven
- Agency: Senniger Powers LLP
- Main IPC: C23C18/34
- IPC: C23C18/34 ; C23C18/36
Abstract:
A method of preparing an aqueous electroless deposition composition for electrolessly depositing Co or a Co alloy onto a substrate in manufacture of microelectronic devices by treating water or an aqueous electroless deposition composition with a deoxygenating treatment to reduce the oxygen concentration.
Public/Granted literature
- US20080090414A1 MANUFACTURE OF ELECTROLESS COBALT DEPOSITION COMPOSITIONS FOR MICROELECTRONICS APPLICATIONS Public/Granted day:2008-04-17
Information query
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