Invention Grant
- Patent Title: Electroless palladium plating liquid
- Patent Title (中): 无电镀钯液
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Application No.: US11988353Application Date: 2006-07-07
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Publication No.: US07704307B2Publication Date: 2010-04-27
- Inventor: Akihiro Aiba , Hirofumi Takahashi
- Applicant: Akihiro Aiba , Hirofumi Takahashi
- Applicant Address: JP Tokyo
- Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Flynn, Thiel, Boutell & Tanis, P.C.
- Priority: JP2005-209696 20050720
- International Application: PCT/JP2006/313565 WO 20060707
- International Announcement: WO2007/010760 WO 20070125
- Main IPC: C23C18/44
- IPC: C23C18/44 ; B05D1/18

Abstract:
An electroless palladium plating liquid, with excellent bath stability, that can provide a film with excellent corrosion resistance, solder bondability, and wire bondability is provided. The invention is an electroless palladium plating liquid, containing: a water soluble palladium compound; at least one of ammonia, an amine compound, an aminocarboxylic acid compound, and carboxylic acid as a complexing agent; and bismuth or a bismuth compound as a stabilizer. Preferably the electroless palladium plating liquid further contains at least one of hypophosphorous acid, phosphorous acid, formic acid, acetic acid, hydrazine, a boron hydride compound, an amine borane compound, and salts thereof as a reducing agent.
Public/Granted literature
- US20090081369A1 Electroless Palladium Plating Liquid Public/Granted day:2009-03-26
Information query
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