Invention Grant
- Patent Title: Technique for the growth of planar semi-polar gallium nitride
- Patent Title (中): 平面半极性氮化镓生长技术
-
Application No.: US11621482Application Date: 2007-01-09
-
Publication No.: US07704331B2Publication Date: 2010-04-27
- Inventor: Troy J. Baker , Benjamin A. Haskell , Paul T. Fini , Steven P. DenBaars , James S. Speck , Shuji Nakamura
- Applicant: Troy J. Baker , Benjamin A. Haskell , Paul T. Fini , Steven P. DenBaars , James S. Speck , Shuji Nakamura
- Applicant Address: US CA Oakland JP Kawaguchi, Saitama Prefecture
- Assignee: The Regents of the University of California,Japan Science and Technology Agency
- Current Assignee: The Regents of the University of California,Japan Science and Technology Agency
- Current Assignee Address: US CA Oakland JP Kawaguchi, Saitama Prefecture
- Agency: Gates & Cooper LLP
- Main IPC: H01L29/04
- IPC: H01L29/04
Abstract:
A method for growing planar, semi-polar nitride film on a miscut spinel substrate, in which a large area of the planar, semi-polar nitride film is parallel to the substrate's surface. The planar films and substrates are: (1) {10 11} gallium nitride (GaN) grown on a {100} spinel substrate miscut in specific directions, (2) {10 13} gallium nitride (GaN) grown on a {110} spinel substrate, (3) {11 22} gallium nitride (GaN) grown on a {1 100} sapphire substrate, and (4) {10 13} gallium nitride (GaN) grown on a {1 100} sapphire substrate.
Public/Granted literature
- US20070111531A1 TECHNIQUE FOR THE GROWTH OF PLANAR SEMI-POLAR GALLIUM NITRIDE Public/Granted day:2007-05-17
Information query
IPC分类:
