Invention Grant
- Patent Title: Pressurized reference systems and process for their production
- Patent Title (中): 加压参考系统及其生产过程
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Application No.: US11011117Application Date: 2004-12-15
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Publication No.: US07704359B2Publication Date: 2010-04-27
- Inventor: Fabio Sovrano , Rolf Thrier
- Applicant: Fabio Sovrano , Rolf Thrier
- Applicant Address: CH Bonaduz
- Assignee: Hamilton Bonaduz AG
- Current Assignee: Hamilton Bonaduz AG
- Current Assignee Address: CH Bonaduz
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: EP03028997 20031217
- Main IPC: G01N27/00
- IPC: G01N27/00 ; G01N27/26 ; G01N27/30 ; G01N27/403

Abstract:
The present application relates to a pressurized reference electrode and to a process for its production, said reference electrode comprising a chamber (11) which has a flowable reference electrolyte, and a portion of the wall of said chamber being formed from porous material (10) for contacting said reference electrode with a measuring medium, and said chamber being under overpressure, which is characterized in that the overpressure is generated in said reference electrode by introducing a gas or/and a liquid through said porous material of the wall in said chamber, or introducing said reference electrolyte into said chamber and closing said chamber under pressure.
Public/Granted literature
- US20050133369A1 Pressurized reference systems and process for their production Public/Granted day:2005-06-23
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