Invention Grant
- Patent Title: Producing a covered through substrate via using a temporary cap layer
- Patent Title (中): 通过使用临时盖层生产覆盖的基板
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Application No.: US12092605Application Date: 2006-11-03
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Publication No.: US07704881B2Publication Date: 2010-04-27
- Inventor: Johan H. Klootwijk , Antonius L. A. M. Kemmeren , Ronald Dekker , Eric Cornelis Egbertus Van Grunsven , Freddy Roozeboom
- Applicant: Johan H. Klootwijk , Antonius L. A. M. Kemmeren , Ronald Dekker , Eric Cornelis Egbertus Van Grunsven , Freddy Roozeboom
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP05110466 20051108
- International Application: PCT/IB2006/054082 WO 20061103
- International Announcement: WO2007/054867 WO 20070518
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
The present invention relates to a method for producing a substrate with at least one covered via that electrically and preferably also thermally connects a first substrate side with an opposite second substrate side. The processing involves forming a trench on a the first substrate side remains and covering the trench with a permanent layer on top of a temporary, sacrificial cap-layer, which is decomposed in a thermal process step. The method of the invention provides alternative ways to remove decomposition products of the sacrificial cap-layer material without remaining traces or contamination even in the presence of the permanent layer. This is, according to a first aspect of the invention, achieved by providing the substrate trench with an overcoat layer that has holes. The holes in the overcoat layer leave room for the removal of the decomposition products of the cap-layer material. According to the second aspect of the invention, opening the covered trench from the second substrate side and allowing the cap-layer material to be removed through that opening provides a solution. Both methods of the present invention are based on the common idea of using a temporary cap-layer even in a situation where the substrate opening is permanently covered before the removal of the temporary cap-layer.
Public/Granted literature
- US20080280435A1 Producing a Covered Through Substrate Via Using a Temporary Cap Layer Public/Granted day:2008-11-13
Information query
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