Invention Grant
- Patent Title: Photosensitive compounds, photopolymerizable compositions including the same, and methods of making and using the same
- Patent Title (中): 感光性化合物,包含其的光聚合性组合物及其制备和使用方法
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Application No.: US11781317Application Date: 2007-07-23
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Publication No.: US07705064B2Publication Date: 2010-04-27
- Inventor: Anthony F. Jacobine , John G. Woods , Joel D. Schall , Steven T. Nakos , Andrew D. Messana , David M. Glaser
- Applicant: Anthony F. Jacobine , John G. Woods , Joel D. Schall , Steven T. Nakos , Andrew D. Messana , David M. Glaser
- Applicant Address: US CT Rocky Hill
- Assignee: Henkel Corporation
- Current Assignee: Henkel Corporation
- Current Assignee Address: US CT Rocky Hill
- Agent Steven C. Bauman
- Main IPC: C08F2/50
- IPC: C08F2/50 ; C08F222/10 ; C07C69/587 ; C08G16/00

Abstract:
The present invention is directed to reaction products prepared from at least one Michael addition donor material including two or more active methylene hydrogens; and at least one material capable of reacting with a Michael addition donor, the material having one Michael addition acceptor and at least one functional group selected from the group consisting of hydroxy, hydroxyalkyl, vinyl ether, amino, aminoalkyl, carboxy, carboxyalkyl, cyano, and cyanoalkyl groups; or reaction products prepared from (a) at least one Michael addition donor material comprising at least one Michael Addition donor group selected from the group consisting of cyano functional groups and phosphono functional groups; and (b) at least one material capable of reacting with the at least one Michael addition donor group, the material having at least one Michael addition acceptor, wherein the above reaction products are capable of forming free radicals upon exposure to actinic radiation; as well as compositions, and processes for making and using the same.
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