Invention Grant
- Patent Title: N-type carbon nanotube field effect transistor and method of fabricating the same
- Patent Title (中): N型碳纳米管场效应晶体管及其制造方法
-
Application No.: US12107318Application Date: 2008-04-22
-
Publication No.: US07705347B2Publication Date: 2010-04-27
- Inventor: Eun-ju Bae , Yo-sep Min , Wan-jun Park
- Applicant: Eun-ju Bae , Yo-sep Min , Wan-jun Park
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2004-0078544 20041002
- Main IPC: H01L35/24
- IPC: H01L35/24

Abstract:
Provided are an n-type carbon nanotube field effect transistor (CNT FET) and a method of fabricating the n-type CNT FET. The n-type CNT FET may include a substrate; electrodes formed on the substrate and separated from each other; a CNT formed on the substrate and electrically connected to the electrodes; a gate oxide layer formed on the CNT; and a gate electrode formed on the gate oxide layer, wherein the gate oxide layer contains electron donor atoms which donate electrons to the CNT such that the CNT may be n-doped by the electron donor atoms.
Public/Granted literature
- US20080191280A1 N-TYPE CARBON NANOTUBE FIELD EFFECT TRANSISTOR AND METHOD OF FABRICATING THE SAME Public/Granted day:2008-08-14
Information query
IPC分类: