Invention Grant
- Patent Title: Methods for the formation of fully silicided metal gates
- Patent Title (中): 形成完全硅化金属门的方法
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Application No.: US10885462Application Date: 2004-07-06
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Publication No.: US07705405B2Publication Date: 2010-04-27
- Inventor: Glenn A. Biery , Michelle L. Steen
- Applicant: Glenn A. Biery , Michelle L. Steen
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Louis J. Percello, Esq.
- Main IPC: H01L21/336
- IPC: H01L21/336
Abstract:
An advanced gate structure that includes a fully silicided metal gate and silicided source and drain regions in which the fully silicided metal gate has a thickness that is greater than the thickness of the silicided source/drain regions is provided. Methods of forming the advanced gate structure are also provided.
Public/Granted literature
- US20060006476A1 Methods for the formation of fully silicided metal gates Public/Granted day:2006-01-12
Information query
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