Invention Grant
- Patent Title: Exposure system
- Patent Title (中): 曝光系统
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Application No.: US11406049Application Date: 2006-04-17
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Publication No.: US07705967B2Publication Date: 2010-04-27
- Inventor: Hans Opower , Stefan Scharl
- Applicant: Hans Opower , Stefan Scharl
- Applicant Address: CH Appenzell
- Assignee: KLEO Maschinenbau AG
- Current Assignee: KLEO Maschinenbau AG
- Current Assignee Address: CH Appenzell
- Agency: Lipsitz & McAllister, LLC
- Priority: DE102005019144 20050419; DE102006008075 20060222
- Main IPC: G03B27/54
- IPC: G03B27/54

Abstract:
In an exposure system for substrate members which bear a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier bearing the substrate member and an exposure device, wherein the substrate member and the exposure device can be moved relative to one another such that the photosensitive coating can be exposed as a result of this relative movement, it is suggested for an exposure of the photosensitive coating which is as precise as possible that the exposure device have an optics slide which can be moved in the second direction and on which an optical imaging device for the exposure of the substrate member is arranged, and that the exposure device have a light source unit which is arranged on the machine frame separately from the optics slide and has a plurality of light sources, the radiation of which can be coupled into the optical imaging device.
Public/Granted literature
- US20060244943A1 Exposure system Public/Granted day:2006-11-02
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