Invention Grant
- Patent Title: Projection optical system, method of manufacturing projection optical system, exposure apparatus, and exposure method
- Patent Title (中): 投影光学系统,投影光学系统的制造方法,曝光装置和曝光方法
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Application No.: US11662066Application Date: 2005-09-08
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Publication No.: US07706074B2Publication Date: 2010-04-27
- Inventor: Yuji Kudo , Takeshi Iwasaki
- Applicant: Yuji Kudo , Takeshi Iwasaki
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-265674 20040913
- International Application: PCT/JP2005/016496 WO 20050908
- International Announcement: WO2006/030684 WO 20060323
- Main IPC: G02B1/00
- IPC: G02B1/00

Abstract:
A projection optical system provided with at least one of optical members made of a calcium fluoride single crystal, wherein each of the optical members satisfies at least any one of the following conditions of (i) to (iii): (i) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 50 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.35 nm/cm; (ii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 100 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.45 nm/cm; and (iii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 150 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.50 nm/cm.
Public/Granted literature
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B1/00 | 按制造材料区分的光学元件;用于光学元件的光学涂层 |