Invention Grant
- Patent Title: Structure of supercapacitor and method for manufacturing the same
- Patent Title (中): 超级电容器的结构及其制造方法
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Application No.: US11698139Application Date: 2007-01-26
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Publication No.: US07706126B2Publication Date: 2010-04-27
- Inventor: Yung Sheng Huang
- Applicant: Yung Sheng Huang
- Applicant Address: TW Taipei County
- Assignee: CTech Corporation
- Current Assignee: CTech Corporation
- Current Assignee Address: TW Taipei County
- Agency: Rosenberg, Klein & Lee
- Priority: TW95145001A 20061204
- Main IPC: H01G9/00
- IPC: H01G9/00

Abstract:
The method for manufacturing a supercapacitor according to the present invention includes the following steps. First, stack a bottom electrode plate and a top electrode plate in parallel. Then, install a first rubber frame and a second rubber frame face-to-face on the bottom and the top electrode plates. The first rubber frame is adapted with a first opening, while the second rubber frame is adapted with a second opening. Next, install an isolation membrane in a space surrounded by the first and the second rubber frames. Afterwards, bind the first and the second rubber frames. Then, produce vacuum in the space. Next, place the bottom and the top electrode plates into an electrolyte to make the electrolyte flow into the space. Finally, use a first resin to seal the first and the second openings. Thereby, the short-circuit phenomenon caused by long-term usage of the supercapacitor can be prevented. In addition, the structural strength of the supercapacitor can be reinforced to avoid electrolyte-leakage phenomenon.
Public/Granted literature
- US20080127468A1 Structure of supercapaccitor and method for manufacturing the same Public/Granted day:2008-06-05
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