Invention Grant
- Patent Title: Device for holding a template for use in imprint lithography
- Patent Title (中): 用于保存用于压印光刻的模板的装置
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Application No.: US10747737Application Date: 2003-12-29
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Publication No.: US07708542B2Publication Date: 2010-05-04
- Inventor: Todd C. Bailey , Byung-Jin Choi , Matthew E. Colburn , Sidlgata V. Sreenivasan , Carlton G. Willson , John G. Ekerdt
- Applicant: Todd C. Bailey , Byung-Jin Choi , Matthew E. Colburn , Sidlgata V. Sreenivasan , Carlton G. Willson , John G. Ekerdt
- Applicant Address: US TX Austin
- Assignee: Board of Regents, The University of Texas System
- Current Assignee: Board of Regents, The University of Texas System
- Current Assignee Address: US TX Austin
- Agent Laura C. Robinson
- Main IPC: B29C59/02
- IPC: B29C59/02

Abstract:
Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder. The template holder may include a body with an opening configured to receive the template, a support plate, and at least one piezo actuator coupled to the body. The piezo actuator may be configured to alter a physical dimension of the template during use.
Public/Granted literature
- US20040141163A1 Device for holding a template for use in imprint lithography Public/Granted day:2004-07-22
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