Invention Grant
- Patent Title: System and methods for treating transient process gas
- Patent Title (中): 瞬态过程气体处理系统及方法
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Application No.: US11938076Application Date: 2007-11-09
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Publication No.: US07708801B2Publication Date: 2010-05-04
- Inventor: Pradeep Thacker , Sachin Naphad
- Applicant: Pradeep Thacker , Sachin Naphad
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: Armstrong Teasdale LLP
- Main IPC: B01D53/14
- IPC: B01D53/14 ; B01D53/18
Abstract:
A system and methods of reducing sulfur emissions are provided. In one embodiment, a method for reducing sulfur emissions is provided. The method includes routing at least a portion of an untreated gas to a low pressure absorber, removing at least a portion of sulfur from the untreated gas to create a low pressure absorber overhead gas, and further processing the low pressure absorber overhead gas.
Public/Granted literature
- US20090120285A1 SYSTEM AND METHODS FOR TREATING TRANSIENT PROCESS GAS Public/Granted day:2009-05-14
Information query
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