Invention Grant
- Patent Title: Noncontact localized electrochemical deposition of metal thin films
- Patent Title (中): 金属薄膜的非接触局部电化学沉积
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Application No.: US11516065Application Date: 2006-09-06
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Publication No.: US07708875B2Publication Date: 2010-05-04
- Inventor: Suresh Ramarajan , Whonchee Lee
- Applicant: Suresh Ramarajan , Whonchee Lee
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: C25D5/00
- IPC: C25D5/00

Abstract:
A method of selectively depositing metal features on a conductive surface of a substrate. An electrode assembly that includes a plurality of electrodes connected in series so as to be oppositely polarized when a voltage is applied thereacross is positioned over the conductive surface of the substrate. The plurality of electrodes is in close proximity to, but does not contact, the conductive surface of the substrate. Positively charged portions and negatively charged portions of the conductive surface of the substrate are created and metal ions are deposited on the negatively charged portions.
Public/Granted literature
- US20070000786A1 Noncontact localized electrochemical deposition of metal thin films Public/Granted day:2007-01-04
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