Invention Grant
US07708880B2 Chemical liquid supply apparatus and a chemical liquid supply method 失效
化学液体供应装置和化学液体供应方法

  • Patent Title: Chemical liquid supply apparatus and a chemical liquid supply method
  • Patent Title (中): 化学液体供应装置和化学液体供应方法
  • Application No.: US10477933
    Application Date: 2002-12-06
  • Publication No.: US07708880B2
    Publication Date: 2010-05-04
  • Inventor: Takeo Yajima
  • Applicant: Takeo Yajima
  • Applicant Address: JP Tokyo
  • Assignee: Koganel Corporation
  • Current Assignee: Koganel Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: McCormick, Paulding & Huber LLP
  • Priority: JP2001-401216 20011228
  • International Application: PCT/JP02/12823 WO 20021206
  • International Announcement: WO03/057343 WO 20030717
  • Main IPC: B01D35/01
  • IPC: B01D35/01
Chemical liquid supply apparatus and a chemical liquid supply method
Abstract:
A buffer tank section (6) includes a liquid accumulation chamber (61) communicating with, through a liquid introduction flow path (42), a liquid tank (46) accumulation chemical liquid. A filter section (4) includes a filter inlet (41a) and a filter outlet (41b), wherein the filter inlet (41a) communicates with a liquid discharge vent (60d) of the buffer tank section (6). In a pump (11), a pump inlet (11a) is connected to the filter outlet (41b) and a pump outlet (11b) is connected to a discharge nozzle (50) through a liquid discharge flow path (47). A return flow path (48) is connected between the pump outlet (11b) and the buffer tank section (6), wherein the chemical liquid, discharged from the pump (11), is returned to the liquid accumulation chamber (61). An exhaust flow path (49) is connected to the buffer tank section (6), thereby exhausting air in the liquid accumulation chamber (61).
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