Invention Grant
- Patent Title: Capillary imprinting technique
- Patent Title (中): 毛细管压印技术
-
Application No.: US12026049Application Date: 2008-02-05
-
Publication No.: US07708926B2Publication Date: 2010-05-04
- Inventor: Byung-Jin Choi , Sidlgata V. Sreenivasan
- Applicant: Byung-Jin Choi , Sidlgata V. Sreenivasan
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agent Laura C. Robinson
- Main IPC: B29C41/12
- IPC: B29C41/12 ; B81C1/00

Abstract:
The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, spontaneous capillary filling of the volume between the mold and the substrate occurs.
Public/Granted literature
- US20080174046A1 Capillary Imprinting Technique Public/Granted day:2008-07-24
Information query