Invention Grant
- Patent Title: Process for the separation and purification of hafnium and zirconium
- Patent Title (中): 铪和锆的分离和纯化方法
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Application No.: US11632021Application Date: 2005-07-07
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Publication No.: US07708962B2Publication Date: 2010-05-04
- Inventor: Laurence Delons , Stéphane Lagarde , Alain Favre-Reguillon , Stéphane Pellet-Rostaing , Marc Lemaire , Ludovic Poriel
- Applicant: Laurence Delons , Stéphane Lagarde , Alain Favre-Reguillon , Stéphane Pellet-Rostaing , Marc Lemaire , Ludovic Poriel
- Applicant Address: FR Courbevoie
- Assignee: Compagnie Europeenne du Zirconium-Cezus
- Current Assignee: Compagnie Europeenne du Zirconium-Cezus
- Current Assignee Address: FR Courbevoie
- Agency: Davidson, Davidson & Kappel, LLC
- Priority: FR0407721 20040709
- International Application: PCT/FR2005/001757 WO 20050707
- International Announcement: WO2006/016045 WO 20060216
- Main IPC: B01D11/00
- IPC: B01D11/00
Abstract:
A process for the separation and purification of hafnium and zirconium.
Public/Granted literature
- US20090117018A9 Process for the Separation and Purification of Hafnium and Zirconium Public/Granted day:2009-05-07
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