A chemically amplified negative resist composition is provided in addition to a method of forming a resist pattern from which a desirable pattern shape can be obtained. A negative resist composition in which a resin component (A) contains a resin component (A1) having a structural unit (a1) containing an alicyclic group having a fluorinated hydroxyalkyl group and a structural unit (a2) derived from an acrylic acid ester and containing a hydroxyl group-containing alicyclic group; and an acid generator component (B) contains an acid generator (B1) expressed by the following general formula (B1): (where R51 represents a straight chain, branched chain or cyclic alkyl group or a fluorinated alkyl group; R52 represents a hydrogen atom, hydroxyl group, halogen atom, straight chain, branched chain or cyclic alkyl group, straight chain or branched chain halogenated alkyl group, or straight chain or branched chain alkoxy group; R53 represents an aryl group which may have a substituent; and n represents an integer of 1 to 3).