Invention Grant
- Patent Title: Semiconductor laser with narrow beam divergence
- Patent Title (中): 具有窄光束发散的半导体激光器
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Application No.: US12141847Application Date: 2008-06-18
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Publication No.: US07709280B2Publication Date: 2010-05-04
- Inventor: Guowen Yang
- Applicant: Guowen Yang
- Applicant Address: US CA Milpitas
- Assignee: JDS Uniphase Corporation
- Current Assignee: JDS Uniphase Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Pequignot + Myers LLC
- Agent Matthew A. Pequignot
- Main IPC: H01L29/06
- IPC: H01L29/06

Abstract:
The invention relates to a method of reducing vertical divergence of a high-power semiconductor laser with a negligible threshold current and conversion efficiency penalty. The low divergence is achieved by increasing the thickness of the n-cladding layer in an asymmetric laser diode stack structure, to a value ranging from 1 to 4 times the laser mode size measured at 10% level. The divergence may be tuned by adjusting the n-cladding layer parameters in an area of the tail the optical mode, measuring 0.03% or less of the maximal optical power density of said optical mode.
Public/Granted literature
- US20090011531A1 Semiconductor Laser With Narrow Beam Divergence Public/Granted day:2009-01-08
Information query
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