Invention Grant
- Patent Title: Method for producing a light emitting device
- Patent Title (中): 发光元件的制造方法
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Application No.: US10575489Application Date: 2004-11-11
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Publication No.: US07709282B2Publication Date: 2010-05-04
- Inventor: Hiroshi Fukshima , Masao Kubo , Akira Inoue , Kenichiro Tanaka , Mikio Masui , Shinji Matsui
- Applicant: Hiroshi Fukshima , Masao Kubo , Akira Inoue , Kenichiro Tanaka , Mikio Masui , Shinji Matsui
- Applicant Address: JP Osaka
- Assignee: Panasonic Electric Works Co., Ltd.
- Current Assignee: Panasonic Electric Works Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2003-383064 20031112
- International Application: PCT/JP2004/017121 WO 20041111
- International Announcement: WO2005/048361 WO 20050526
- Main IPC: H01L21/56
- IPC: H01L21/56

Abstract:
A production method for producing a light-emitting device 1 in which a light-emitting layer at least comprised of a n-type substrate bearing layer 3 and a p-type substrate bearing layer 4 is layered on a transparent crystal substrate 2 is provided with a step of forming a transfer layer 5 on at least a part of the transparent crystal substrate 2 or the light-emitting layer 3, 4, which transfer layer 5 is softened or set upon supplying an energy thereto; a step of pressing a mold 6 formed with a minute unevenness structure 61 against the transfer layer 5 to transfer the minute unevenness structure 61 to an outer surface of the transfer layer 5, and a step of forming a minute unevenness structure 21, 34 for preventing multiple reflection based on the minute unevenness structure 51 transferred to the transfer layer 5.
Public/Granted literature
- US20070065960A1 Method for producing a light emitting device Public/Granted day:2007-03-22
Information query
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