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US07709327B2 Methods of forming semiconductor-on-insulator substrates, and integrated circuitry 有权
形成绝缘体上半导体衬底和集成电路的方法

Methods of forming semiconductor-on-insulator substrates, and integrated circuitry
Abstract:
Some embodiments include methods of forming voids within semiconductor constructions. In some embodiments the voids may be utilized as microstructures for distributing coolant, for guiding electromagnetic radiation, or for separation and/or characterization of materials. Some embodiments include constructions having micro-structures therein which correspond to voids, conduits, insulative structures, semiconductor structures or conductive structures.
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