Invention Grant
- Patent Title: Method of making thermally programmable anti-reverse engineering interconnects wherein interconnects only conduct when heated above room temperature
- Patent Title (中): 制造热可编程抗反向工程互连的方法,其中互连仅在室温以上被加热时才导通
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Application No.: US12035448Application Date: 2008-02-22
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Publication No.: US07709401B2Publication Date: 2010-05-04
- Inventor: Fen Chen , Cathryn Jeanne Christiansen , Michael Anthony Shinosky , Timothy Dooling Sullivan
- Applicant: Fen Chen , Cathryn Jeanne Christiansen , Michael Anthony Shinosky , Timothy Dooling Sullivan
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Agent Richard M. Kotulak
- Main IPC: H01L21/477
- IPC: H01L21/477 ; H01L21/4763 ; H01L21/469 ; H01L21/768 ; H01L23/485 ; H01L23/532

Abstract:
An interconnect and method of making the interconnect. The method includes forming a dielectric layer on a substrate, the dielectric layer having a top surface and a bottom surface; forming a first wire and a second wire in the dielectric layer, the first wire separated from the second wire by a region of the dielectric layer; and forming metallic nanoparticles in or on the top surface of the dielectric layer between the first and second wires, the metallic nanoparticles capable of electrically connecting the first wire and the second wire only while the nanoparticles are heated to a temperature greater than room temperature and a voltage is applied between the first and second wires.
Public/Granted literature
- US20090212431A1 THERMALLY PROGRAMMABLE ANTI-REVERSE ENGINEERING INTERCONNECTS AND METHODS OF FABRICATING SAME Public/Granted day:2009-08-27
Information query
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