Invention Grant
- Patent Title: Cleansing composition
- Patent Title (中): 清洁成分
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Application No.: US10917413Application Date: 2004-08-13
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Publication No.: US07709430B2Publication Date: 2010-05-04
- Inventor: Hiroki Mizushima
- Applicant: Hiroki Mizushima
- Applicant Address: JP Tokyo
- Assignee: Kao Corporation
- Current Assignee: Kao Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2003-298058 20030822
- Main IPC: A61K7/00
- IPC: A61K7/00

Abstract:
A cleansing composition containing the following components (A) to (C): (A) an anionic surfactant (B) a copolymer of a dialkyl diallyl ammonium salt/acrylamide (C) fatty acid alkanolamide and/or polyoxyethylene alkyl ether, wherein pH at 25° C., in 20 weight times water dilution, is 2 to 4.5. The present cleansing composition has a good foamability in hair washing, a fine-textured and soft foam quality, and in particular, a good smoothness in rinsing and lasting the smoothness longer in rinsing.
Public/Granted literature
- US20050049169A1 Cleansing composition Public/Granted day:2005-03-03
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