Invention Grant
- Patent Title: Microstructure synthesis by flow lithography and polymerization
- Patent Title (中): 通过流动光刻和聚合的微结构合成
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Application No.: US11586197Application Date: 2006-10-25
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Publication No.: US07709544B2Publication Date: 2010-05-04
- Inventor: Patrick S. Doyle , Daniel C. Pregibon , Dhananjay Dendukuri
- Applicant: Patrick S. Doyle , Daniel C. Pregibon , Dhananjay Dendukuri
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agent Theresa A. Lober
- Main IPC: C08F2/46
- IPC: C08F2/46 ; C08F2/48 ; C08F2/50
Abstract:
In a method for synthesizing polymeric microstructures, a monomer stream is flowed, at a selected flow rate, through a fluidic channel. At least one shaped pulse of illumination is projected to the monomer stream, defining in the monomer stream a shape of at least one microstructure corresponding to the illumination pulse shape while polymerizing that microstructure shape in the monomer stream by the illumination pulse.
Public/Granted literature
- US20070105972A1 Microstructure synthesis by flow lithography and polymerization Public/Granted day:2007-05-10
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