Invention Grant
- Patent Title: Synthetic methodology for the reductive alkylation at the C-3 position of indoles
- Patent Title (中): 吲哚C-3位还原烷基化合成方法
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Application No.: US11872193Application Date: 2007-10-15
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Publication No.: US07709661B2Publication Date: 2010-05-04
- Inventor: Ronald S. Michalak , Panolil Raveendranath
- Applicant: Ronald S. Michalak , Panolil Raveendranath
- Applicant Address: US NJ Madison
- Assignee: Wyeth LLC
- Current Assignee: Wyeth LLC
- Current Assignee Address: US NJ Madison
- Agent Thomas C. McKenzie
- Main IPC: C07D209/14
- IPC: C07D209/14
Abstract:
A process for the reductive alkylation at the C-3 position of an indole compound in which the indole is treated with an aldehyde in the presence of a Lewis acid and a silicon hydride reducing agent. The process is useful for alkylating the C-3 position of indoles that contain acid-sensitive substituents at the N-1 position.
Public/Granted literature
- US20080161581A1 SYNTHETIC METHODOLOGY FOR THE REDUCTIVE ALKYLATION AT THE C-3 POSITION OF INDOLES Public/Granted day:2008-07-03
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