Invention Grant
- Patent Title: RF circuits including transistors having strained material layers
- Patent Title (中): RF电路包括具有应变材料层的晶体管
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Application No.: US11032413Application Date: 2005-01-10
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Publication No.: US07709828B2Publication Date: 2010-05-04
- Inventor: Glyn Braithwaite , Richard Hammond , Matthew Currie
- Applicant: Glyn Braithwaite , Richard Hammond , Matthew Currie
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
Circuits for processing radio frequency (“RF”) and microwave signals are fabricated using field effect transistors (“FETs”) that have one or more strained channel layers disposed on one or more planarized substrate layers. FETs having such a configuration exhibit improved values for, for example, transconductance and noise figure. RF circuits such as, for example, voltage controlled oscillators (“VCOs”), low noise amplifiers (“LNAs”), and phase locked loops (“PLLs”) built using these FETs also exhibit enhanced performance.
Public/Granted literature
- US20050116219A1 RF circuits including transistors having strained material layers Public/Granted day:2005-06-02
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