Invention Grant
- Patent Title: High-efficiency Schottky rectifier and method of manufacturing same
- Patent Title (中): 高效肖特基整流器及其制造方法
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Application No.: US11400621Application Date: 2006-04-07
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Publication No.: US07709864B2Publication Date: 2010-05-04
- Inventor: Roman Hamerski , Chris Hruska , Fazia Hossain
- Applicant: Roman Hamerski , Chris Hruska , Fazia Hossain
- Applicant Address: US MO Lee's Summit
- Assignee: Diodes Fabtech Inc
- Current Assignee: Diodes Fabtech Inc
- Current Assignee Address: US MO Lee's Summit
- Agency: Spencer Fan Britt & Browne LLP
- Main IPC: H01L29/80
- IPC: H01L29/80

Abstract:
A rectifier device (10) comprising a multi-layer epitaxial film (12) and a rectifier and a transistor manufactured in the film (12), wherein the transistor is oriented vertically relative to the plane of the rectifier. The rectifier and transistor are separated by a transition zone of inverted bias. The rectifier is a Schottky barrier rectifier, and the transistor is a JFET. More specifically, the device (1) comprises the film (12), a trench (16), a first region (18) associated with an upper portion of the trench (16), and second region (20) associated with a lower portion. The interface between the p+ material of the second region (20) and the n material of the film (12) creates a p+/n junction. The device (10) has use in high frequency, low-loss power circuit applications in which high switching speed and low forward voltage drop are desirable.
Public/Granted literature
- US20070235830A1 High-efficiency Schottky rectifier and method of manufacturing same Public/Granted day:2007-10-11
Information query
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