Invention Grant
- Patent Title: Solid state imaging device and method of manufacturing the same
- Patent Title (中): 固态成像装置及其制造方法
-
Application No.: US11945819Application Date: 2007-11-27
-
Publication No.: US07709917B2Publication Date: 2010-05-04
- Inventor: Noriaki Suzuki
- Applicant: Noriaki Suzuki
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPP2006-321783 20061129
- Main IPC: H01L31/058
- IPC: H01L31/058

Abstract:
A solid state imaging device comprises: a photoelectric converting portion; a charge transferring portion including a charge transfer electrode for transferring an electric charge generated in the photoelectric converting portion; and a shielding film formed through an insulating film containing nitrogen on the charge transferring portion, wherein the insulating film containing the nitrogen includes: a first insulating film that covers at least a part of an upper surface of the charge transfer electrode; and a second insulating film formed to reach the upper surface of the charge transfer electrode from the photoelectric converting portion, and the first and second insulating films include a discontinuing portion.
Public/Granted literature
- US20080122022A1 SOLID STATE IMAGING DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2008-05-29
Information query