Invention Grant
- Patent Title: Photoelectric conversion device and manufacturing method thereof
- Patent Title (中): 光电转换装置及其制造方法
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Application No.: US11962489Application Date: 2007-12-21
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Publication No.: US07709918B2Publication Date: 2010-05-04
- Inventor: Sakae Hashimoto
- Applicant: Sakae Hashimoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2003-150604 20030528; JP2004-148986 20040519
- Main IPC: H01L31/0232
- IPC: H01L31/0232

Abstract:
A photoelectric conversion device is provided which is capable of improving the light condensation efficiency without substantially decreasing the sensitivity. The photoelectric conversion device has a first pattern provided above an element isolation region formed between adjacent two photoelectric conversion elements, a second pattern provided above the element isolation region and above the first pattern, and microlenses provided above the photoelectric conversion elements with the first and the second patterns provided therebetween. The photoelectric conversion device further has convex-shaped interlayer lenses in optical paths between the photoelectric conversion elements and the microlenses, the peak of each convex shape projecting in the direction from the electro-optical element to the microlens.
Public/Granted literature
- US20080135964A1 PHOTOELECTIC CONVERSION DEVICE AND MANUFACTURING METHOD Public/Granted day:2008-06-12
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