Invention Grant
- Patent Title: Metal-base nanowire transistor
- Patent Title (中): 金属基纳米线晶体管
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Application No.: US12093790Application Date: 2006-10-29
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Publication No.: US07709923B2Publication Date: 2010-05-04
- Inventor: Prabhat Agarwal , Godefridus A. M. Hurkx
- Applicant: Prabhat Agarwal , Godefridus A. M. Hurkx
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP05110934 20051118
- International Application: PCT/IB2006/053995 WO 20061029
- International Announcement: WO2007/057802 WO 20070524
- Main IPC: H01L27/095
- IPC: H01L27/095

Abstract:
A metal-base transistor is suggested. The transistor comprises a first and a second electrode (2, 6) and base electrode (6) to control current flow between the first and second electrode. The first electrode (2) is made from a semiconduction material. The base electrode (3) is a metal layer deposited on top of the semiconducting material forming the first electrode. According the invention the second electrode is formed by a semiconducting nanowire (6) being in electrical contact with the base electrode (3).
Public/Granted literature
- US20080237574A1 Metal-Base Nanowire Transistor Public/Granted day:2008-10-02
Information query
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