Invention Grant
US07710583B2 Surface position measuring system, exposure method and semiconductor device manufacturing method 失效
表面位置测量系统,曝光方法和半导体器件制造方法

Surface position measuring system, exposure method and semiconductor device manufacturing method
Abstract:
There is provided a surface position measuring system which includes a reflectivity computing module which computes predictive reflectivities of a plurality of circuit patterns, an inspection light source which irradiates an inspection light onto each of a plurality of inspection areas, area by area, above the plurality of circuit patterns under irradiation conditions determined based on a corresponding each of the predictive reflectivities of the plurality of circuit patterns, and a photodetector which detects a reflected inspection light reflected from each of the plurality of inspection areas to detect a surface position of a corresponding each of the plurality of inspection areas.
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