Invention Grant
- Patent Title: Projection optical system, exposure system, and exposure method
- Patent Title (中): 投影光学系统,曝光系统和曝光方法
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Application No.: US11645041Application Date: 2006-12-26
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Publication No.: US07710653B2Publication Date: 2010-05-04
- Inventor: Hironori Ikezawa , Yuji Kudo , Yasuhiro Omura
- Applicant: Hironori Ikezawa , Yuji Kudo , Yasuhiro Omura
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-020979 20050128
- Main IPC: G02B27/10
- IPC: G02B27/10

Abstract:
A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, Θ is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25
Public/Granted literature
- US20070188879A1 Projection optical system, exposure system, and exposure method Public/Granted day:2007-08-16
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