Invention Grant
- Patent Title: Method for interlayer and yield based optical proximity correction
- Patent Title (中): 基于中间和屈服的光学邻近校正方法
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Application No.: US11837033Application Date: 2007-08-10
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Publication No.: US07712069B2Publication Date: 2010-05-04
- Inventor: Franz Xaver Zach
- Applicant: Franz Xaver Zach
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent John A. Jordan
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
An optical proximity correction method is provided using a modified merit function based upon yield. Known failure mechanisms related to layout geometries are used to derive yield functions based upon distance values between layout features, such as, edge features. In comparing the edge points on the predicted layout pattern with the corresponding point on the design layout pattern, a yield test is first undertaken before movement of the points on the predicted layout pattern to a position of higher yield. Where yield is acceptable, no further movement is made. Where incremental movement of points results in coming within acceptable proximity before acceptable yield is reached, the point is flagged for further consideration.
Public/Granted literature
- US20080022255A1 METHOD FOR INTERLAYER AND YIELD BASED OPTICAL PROXIMITY CORRECTION Public/Granted day:2008-01-24
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