Invention Grant
- Patent Title: Method of manufacturing a wrap around shield for a perpendicular write pole using a laminated mask with an endpoint detection layer
- Patent Title (中): 使用具有端点检测层的层叠掩模制造用于垂直写入极的环绕屏蔽的方法
-
Application No.: US11615818Application Date: 2006-12-22
-
Publication No.: US07712207B2Publication Date: 2010-05-11
- Inventor: Aron Pentek , Yi Zheng , Howard Gordon Zolla
- Applicant: Aron Pentek , Yi Zheng , Howard Gordon Zolla
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: G11B5/127
- IPC: G11B5/127 ; H04R31/00

Abstract:
A method for manufacturing a magnetic write pole and trailing wrap around magnetic shield for use in a perpendicular magnetic data recording system. The method includes the use of a hard mask structure with end point detection material embedded in a hard mask material. The novel hard mask structure provides the mill resistance of a hard mask, with the end point detection advantages of an end point detection layer.
Public/Granted literature
Information query
IPC分类: