Invention Grant
US07712333B2 Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography
有权
用于EUV光刻中使用的反射掩模板的玻璃基板的表面的平滑化方法
- Patent Title: Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography
- Patent Title (中): 用于EUV光刻中使用的反射掩模板的玻璃基板的表面的平滑化方法
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Application No.: US11391343Application Date: 2006-03-29
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Publication No.: US07712333B2Publication Date: 2010-05-11
- Inventor: Toshiyuki Uno , Yoshiaki Ikuta , Mika Yokoyama , Ken Ebihara
- Applicant: Toshiyuki Uno , Yoshiaki Ikuta , Mika Yokoyama , Ken Ebihara
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: C03C17/02
- IPC: C03C17/02

Abstract:
To provide a method for smoothing a surface of a glass substrate having a concave defect, such as a pit or a scratch.A method for smoothing a surface of a glass substrate having a concave defect thereon, comprising: forming a film on the surface of the glass substrate having the concave defect by a dry deposition method, the film comprising a glass material having a fluid point Tf of 150° C. or above and of not higher than a strain point Ts (° C.) of the glass substrate; and heating the film of the glass material at a temperature of not lower than Tf and not higher than Ts to put the film in such state that the film of the glass material can flow so as to bury the concave defect, followed by cooling the film of the glass material, thereby to smooth the surface of the glass substrate having the concave defect.
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