Invention Grant
- Patent Title: Piezoelectric/electrostrictive film and method for producing the same
- Patent Title (中): 压电/电致伸缩薄膜及其制造方法
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Application No.: US11552260Application Date: 2006-10-24
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Publication No.: US07713366B2Publication Date: 2010-05-11
- Inventor: Iwao Ohwada , Nobuyuki Kobayashi
- Applicant: Iwao Ohwada , Nobuyuki Kobayashi
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Burr & Brown
- Priority: JP2005-310173 20051025
- Main IPC: C03B29/00
- IPC: C03B29/00 ; B44C1/165 ; B44C1/175

Abstract:
A piezoelectric/electrostrictive film is formed on a solid-phase support, the piezoelectric/electrostrictive film including an incompletely bonded region which is incompletely bonded in a predetermined pattern to the solid-phase support, and a bonded region which is bonded to the surface of the solid-phase support so that the incompletely bonded region can be separated. The piezoelectric/electrostrictive film is bonded to a substrate and is separated from the solid-phase support in the bonded region. As a result, the incompletely bonded region is transferred to the substrate. The transferred incompletely bonded region is used as a piezoelectric/electrostrictive film for manufacturing a piezoelectric/electrostrictive film device.
Public/Granted literature
- US20070090729A1 PIEZOELECTRIC/ELECTROSTRICTIVE FILM AND METHOD FOR PRODUCING THE SAME Public/Granted day:2007-04-26
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