Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
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Application No.: US12149218Application Date: 2008-04-29
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Publication No.: US07714288B2Publication Date: 2010-05-11
- Inventor: Tasuku Yano , Zhaohui Cheng , Takashi Furukawa , Osamu Nasu
- Applicant: Tasuku Yano , Zhaohui Cheng , Takashi Furukawa , Osamu Nasu
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Stites & Harbison PLLC
- Agent Juan Carlos A. Marquez, Esq.
- Priority: JP2007-124849 20070509
- Main IPC: G21K7/00
- IPC: G21K7/00 ; G21G5/00 ; G01N23/00 ; H01J3/14

Abstract:
Electrification affected on a surface of a sample which is caused by irradiation of a primary charged particle beam is prevented when plural frames are integrated to obtain an image of a predetermined area of the sample in a charged particle beam apparatus. The predetermined area of the sample is scanned with a primary electron beam from an electron gun, and plural frames are generated and integrated while detecting generated secondary electrons with a detector to obtain the image of the predetermined area. If it is determined by a detection signal of the detector that an electrification amount at the predetermined area becomes a specified value when generating plural frames, an electricity removal voltage is applied to a boosting electrode to remove or reduce the electrification, prior to generation of the next frame. Accordingly, the signal-to-noise ratio of the image obtained by integrating plural frames can be improved.
Public/Granted literature
- US20080277583A1 Charged particle beam apparatus Public/Granted day:2008-11-13
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