Invention Grant
- Patent Title: Exposure apparatus, exposure method, and exposure system
- Patent Title (中): 曝光装置，曝光方法和曝光系统
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Application No.: US11675162Application Date: 2007-02-15
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Publication No.: US07714980B2Publication Date: 2010-05-11
- Inventor: Keita Sakai
- Applicant: Keita Sakai
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2006-037423 20060215; JP2006-353587 20061228; JP2007-026405 20070206
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
An exposure apparatus has a projection optical system configured to project an image of a reticle pattern onto a substrate, and exposes the substrate via liquid supplied to a space between the substrate and the projection optical system. The exposure apparatus includes an oxygen removal unit configured to reduce dissolved oxygen in the liquid by bringing the liquid into contact with a gas other than oxygen, and a degassing unit configured to reduce a dissolved gas in the liquid.
Public/Granted literature
- US20070188725A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND EXPOSURE SYSTEM Public/Granted day:2007-08-16
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