Invention Grant
- Patent Title: Exposure apparatus, exposure method, and device manufacturing method
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Application No.: US11707075Application Date: 2007-02-16
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Publication No.: US07714982B2Publication Date: 2010-05-11
- Inventor: Hiroyuki Nagasaka
- Applicant: Hiroyuki Nagasaka
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-039229 20060216; JP2006-039833 20060216; JP2006/039927 20060216
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
An exposure apparatus includes: an optical system having an optical element on which a first exposure light and a second exposure light are incident, the first exposure light and the second exposure light from the optical element being irradiated onto a first exposure field and a second exposure field; and a detection device that detects at least one of the first exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields.
Public/Granted literature
- US20070273858A1 Exposure apparatus, exposure method, and device manufacturing method Public/Granted day:2007-11-29
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