Invention Grant
- Patent Title: Laser beam conditioning system comprising multiple optical paths allowing for dose control
- Patent Title (中): 激光束调节系统包括允许剂量控制的多个光路
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Application No.: US11753390Application Date: 2007-05-24
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Publication No.: US07714986B2Publication Date: 2010-05-11
- Inventor: Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
- Applicant: Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/54
- IPC: G03B27/54
Abstract:
A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
Public/Granted literature
- US20080291417A1 Laser Beam Conditioning System Comprising Multiple Optical Paths Allowing for Dose Control Public/Granted day:2008-11-27
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