Invention Grant
- Patent Title: Graphics engine for high precision lithography
- Patent Title (中): 用于高精度光刻的图形引擎
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Application No.: US11935267Application Date: 2007-11-05
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Publication No.: US07715641B2Publication Date: 2010-05-11
- Inventor: Martin Olsson , Stefan Gustavson , Torbjörn Sandström , Per Elmfors
- Applicant: Martin Olsson , Stefan Gustavson , Torbjörn Sandström , Per Elmfors
- Applicant Address: SE Taby
- Assignee: Micronic Laser Systems AB
- Current Assignee: Micronic Laser Systems AB
- Current Assignee Address: SE Taby
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Ernest J. Beffel, Jr.
- Main IPC: G06K9/48
- IPC: G06K9/48 ; H04N1/40
Abstract:
The present invention includes a method to use a phase modulating micromirror array to create an intensity image that has high image fidelity, good stability through focus and good x-y symmetry. Particular aspects of the present invention are described in the claims, specification and drawings.
Public/Granted literature
- US20080074700A1 GRAPHICS ENGINE FOR HIGH PRECISION LITHOGRAPHY Public/Granted day:2008-03-27
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